One-Step Cleaning Solution to Replace the Conventional RCA Two-Step Cleaning Recipe for Pregate Oxide Cleaning

One-Step Cleaning Solution to Replace the Conventional RCA Two-Step Cleaning Recipe for Pregate Oxide Cleaning: "The RCA cleaning process was developed in 1970 by Kern and Puotinen,7 which is still employed around the world as a wet cleaning technology to remove contaminants on the wafer surface. The conventional RCA two-step cleaning recipe including SC-1 of NH4OH:H2O2:H2O, 1:1:5, 70°C, 10 min, and SC-2 of HCl:H2O2:H2O, 1:1:6, 70°C, 10 min, has been used for over 30 years. Solution of a high pH value (i.e., SC-1) is used to remove organic contamination and particles. Solution of a low pH value (i.e., SC-2) is used to remove most metallic contamination by acid competition."