677248 Carbon nanotube multi walled >90% MWCNT basis, O.D. × I.D. × L 10-15 nm × 2-6 nm × 0.1-10 μm: "677248
Aldrich
Carbon nanotube, multi-walled ;90% MWCNT basis, O.D. × I.D. × L 10-15 nm × 2-6 nm × 0.1-10 μm"
Friday, November 14, 2008
Monday, October 13, 2008
Direct Synthesis of Magnesium Porphine via 1-Formyldipyrromethane
Direct Synthesis of Magnesium Porphine via 1-Formyldipyrromethane: "J. Org. Chem., 72 (13), 5008 -5011, 2007. 10.1021/jo070532z S0022-3263(07)00532-4
Web Release Date: May 23, 2007
Copyright © 2007 American Chemical Society
Direct Synthesis of Magnesium Porphine via 1-Formyldipyrromethane"
Web Release Date: May 23, 2007
Copyright © 2007 American Chemical Society
Direct Synthesis of Magnesium Porphine via 1-Formyldipyrromethane"
Friday, June 6, 2008
Environmental nanotechnology: Nanomaterials clean up : Article : Nature Nanotechnology
Environmental nanotechnology: Nanomaterials clean up : Article : Nature Nanotechnology: "Membranes made of manganese oxide nanowires can be used to selectively absorb oil from water through a combination of superhydrophobicity and capillary action."
Monday, March 17, 2008
VWR.COM - Product Page
VWR.COM - Product Page: "PAPER GRADE 602H.5/150MM PK100
Supplier: WHATMAN LABORATORY PRODUCTS
View Shopping Basket
Description VWR Catalog# Unit Price Qty
PAPER GRADE 602H.5/150MM PK100 74330-460 Pack of 100 $83.62"
Supplier: WHATMAN LABORATORY PRODUCTS
View Shopping Basket
Description VWR Catalog# Unit Price Qty
PAPER GRADE 602H.5/150MM PK100 74330-460 Pack of 100 $83.62"
Thursday, February 28, 2008
One-Step Cleaning Solution to Replace the Conventional RCA Two-Step Cleaning Recipe for Pregate Oxide Cleaning
One-Step Cleaning Solution to Replace the Conventional RCA Two-Step Cleaning Recipe for Pregate Oxide Cleaning: "The RCA cleaning process was developed in 1970 by Kern and Puotinen,7 which is still employed around the world as a wet cleaning technology to remove contaminants on the wafer surface. The conventional RCA two-step cleaning recipe including SC-1 of NH4OH:H2O2:H2O, 1:1:5, 70°C, 10 min, and SC-2 of HCl:H2O2:H2O, 1:1:6, 70°C, 10 min, has been used for over 30 years. Solution of a high pH value (i.e., SC-1) is used to remove organic contamination and particles. Solution of a low pH value (i.e., SC-2) is used to remove most metallic contamination by acid competition."
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